Sintx Technologies awarded patent on silicon nitride material by USPTO

SINTX Technologies (SINT) announced the issuance of U.S. Patent No. 12,239,761 by the U.S. Patent and Trademark Office, or USPTO. This newly issued patent strengthens SINTX’s intellectual property portfolio, further solidifying its position as a global leader in silicon nitride innovation. The patent covers novel advancements in silicon nitride material processing and applications, particularly in the biomedical sector, where the company continues to make significant strides in next-generation implant technology. The patent, developed by the Company covers innovative methods of adhering silicon nitride to a wide array of biomaterial substrates to improve biocompatibility and resistance to infection, expanding its potential applications to orthopedic, craniomaxillofacial, dental and spinal implants. This scientific breakthrough aligns with SINTX’s broader mission to leverage its proprietary technology to improve patient outcomes and surgical success rates.