Nano Dimension filed for 2nd patent for unique LLM

Nano Dimension announced the filing of a U.S. patent application titled “Large Language Models, LLM, for Efficient Anomaly Detection in Log Files of Industrial Machines”, which is targeted for real-time data analysis and scalable deployment across the Company’s own systems and industrial solutions provided to outside customers. The Log Analysis Patent addresses one of the core challenges for automated anomaly detection. While machine logs are usually a valuable source of information for industrial systems, they are increasingly difficult and expensive to analyze as the underlying systems have grown in complexity and the volume of log data they contain has multiplied. To overcome these problems, Nano Dimension has extended its existing AI patents with a Large Language Model that can operate independently of engineering labels. This enables a fully automated process of AI-powered prediction of manufacturing anomalies before they occur, based either solely on logs or in combination with other machine data and being efficient enough to process billions of log lines. Dr. Eli David, Chief Technology Officer of AI for Nano Dimension, commented: “The filing of the Large Language Models for Efficient Anomaly Detection in Log Files of Industrial Machines patent application is another significant development for Nano Dimension and our customers. A solution is only truly valuable with scalability and this new patent lies at the core of tremendously scalable advanced industrial solutions.”